Characteristics and thermal efficiency of a non-transferred DC plasma spraying torch under low pressure

被引：11

作者：

Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China ^{[1
]}

不详 ^{[2
]}

不详 ^{[3
]}

机构：

[1] Institute of Plasma Physics, Chinese Academy of Sciences

[2] Institute of Modern Physics, Fudan University

[3] School of Material Science and Engineering, Wuhan Institute of Technology

来源：

Plasma Sci. Technol. | 2008年 / 6卷 / 701-705期

关键词：

DC plasmatron; I-V Characteristics; Thermal efficiency; Vacuum;

D O I：

10.1088/1009-0630/10/6/09

中图分类号：

学科分类号：

摘要：

Current-voltage (I-V) characteristics of a non-transferred DC arc plasma spray torch operated in argon at vacuum are reported. The arc voltage is of negative characteristics for a current below 200 A, flat for a current between 200 A to 250 A and positive for a current beyond 250 A. The voltage increases slowly with the increase in carrier gas of arc. The rate of change in voltage with currents is about 3∼4 V/100 A at a gas flow rate of about 1∼1.5 V/10 standard liter per minute (slpm). The I-V characteristics of the DC plasma torch are of a shape of hyperbola. Arc power increases with the argon flow rate, and the thermal efficiency of the torch acts in a similar way. The thermal efficiency of the non-transferred DC plasmatron is about 65∼78%.

引用

页码：701 / 705

页数：4

共 25 条

[1]

Gross B., Grycz B., Miklossy K., Plasma Technology, (1968)

[2]

Boulos M.I., Fauchais P., Pfender E., Thermal Plasmas -Fundamentals and Application, (1994)

[3]

Heinmann Robert B., Plasma-Spray Coating: Principles and Applications, (1996)

[4]

Pawlowski L., The Science and Engineering of Thermal Spray Coatings, (1995)

[5]

Davis J.R., Handbook of Thermal Spray Technology, (2004)

[6]

Ayrton H., The Electric Arc, (1902)

[7]

Nottingham W.B., Trans. Am. Inst. El. Engrs., 42, (1923)

[8]

Nottingham W.B., Phys. Rev., 28, 4, (1926)

[9]

Gage R.M., Arc Torch and Process. Washington: United State Patents and Trademark Office (USPTO), (1958)

[10]

Joachim H., Ann. of the New York Academy Sci., 891, (1999)

← 1 2 3 →