Numerical simulation of plasma in novel plasma reactor for MPCVD diamond film

被引:0
|
作者
Li, Xiao-Jing [1 ]
Yu, Sheng-Wang [1 ]
Zhang, Si-Kai [1 ]
Tang, Wei-Zhong [1 ]
Lv, Fan-Xiu [1 ]
机构
[1] College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China
来源
Rengong Jingti Xuebao/Journal of Synthetic Crystals | 2010年 / 39卷 / 04期
关键词
Compendex;
D O I
暂无
中图分类号
学科分类号
摘要
Finite difference time domain method
引用
收藏
页码:867 / 871
相关论文
共 50 条
  • [1] Design of novel plasma reactor for diamond film deposition
    Li, X. J.
    Tang, W. Z.
    Yu, S. W.
    Zhang, S. K.
    Chen, G. C.
    Lu, F. X.
    DIAMOND AND RELATED MATERIALS, 2011, 20 (04) : 480 - 484
  • [2] Emission spectra of microwave plasma and MPCVD transparent diamond film
    Zhou, J
    He, W
    Yuan, RZ
    Jiang, DS
    Wang, JH
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2000, 10 (04) : 502 - 504
  • [3] Emission spectra of microwave plasma and MPCVD transparent diamond film
    周健
    何伟
    袁润章
    姜德生
    汪建华
    TransactionsofNonferrousMetalsSocietyofChina, 2000, (04) : 502 - 504
  • [4] Numerical optimization of hydrogen microwave plasma reactor for diamond film deposition
    Hrebtov, M. Yu
    Bobrov, M. S.
    XXXV SIBERIAN THERMOPHYSICAL SEMINAR, 2019, 2019, 1382
  • [5] Research on microwave mode and coupling energy in plasma reactor design for MPCVD diamond
    Li, XiaoJing
    Zheng, ShunQi
    Liu, Hongwei
    Gao, Chunyu
    Shi, Xiumei
    Li, Qingxiao
    Ni, Yang
    He, Yong
    PROCEEDINGS OF THE 3RD INTERNATIONAL CONFERENCE ON MATERIAL, MECHANICAL AND MANUFACTURING ENGINEERING, 2015, 27 : 2170 - 2176
  • [6] Novel microwave plasma reactor for diamond synthesis
    Funer, M
    Wild, C
    Koidl, P
    APPLIED PHYSICS LETTERS, 1998, 72 (10) : 1149 - 1151
  • [7] Numerical simulation and experimental study of a novel high-power microwave plasma CVD reactor for diamond films deposition
    An, Kang
    Liu, Xiao-Ping
    Li, Xiao-Jing
    Zhong, Qiang
    Shen, Yan-Yan
    He, Zhi-Yong
    Yu, Sheng-Wang
    Rengong Jingti Xuebao/Journal of Synthetic Crystals, 2015, 44 (06): : 1544 - 1550
  • [8] Numerical simulation of an RF asymmetric nonthermal plasma reactor used for plasma polymerization
    Elaissi, S.
    Alyousef, H.
    INTERNATIONAL JOURNAL OF MULTIPHYSICS, 2019, 13 (02) : 131 - 146
  • [10] Stress in microwave plasma chemical vapor deposited (MPCVD) diamond films
    Naseem, HA
    Haque, MS
    Beera, RA
    Brown, WD
    Malshe, AP
    PROCEEDINGS OF THE THIRTEENTH INTERNATIONAL CONFERENCE ON CHEMICAL VAPOR DEPOSITION, 1996, 96 (05): : 685 - 690