Development of new hydrogenated amorphous silicon thin films with quantum wires

被引：0

作者：

Iida, Mihoka ^{[1
]}

Natori, Emi ^{[1
]}

Motohashi, Mitsuya ^{[1
]}

Homma, Kazuaki ^{[1
]}

机构：

[1] Department of Electrical and Electronic Systems Engineering, Graduate School of Advanced Science and Technology, Tokyo Denki University, 2-2 Kanda-Nishiki-cho, Chlyoda-ku, Tokyo 101-8457, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2007年 / 46卷 / 9 B期

关键词：

Thin films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

页码：6299 / 6302