Effect of crystalline phase formation on optical properties of TiSi2 thin films

被引：0

作者：

State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China ^{[1
]}

不详 ^{[2
]}

机构：

来源：

Taiyangneng Xuebao | 2006年 / 12卷 / 1185-1190期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

共 50 条

[41] SILICON LOSS DURING TISI2 FORMATION [J].

COHEN, C ;

NIPOTI, R ;

SIEJKA, J ;

BENTINI, GG ;

BERTI, M ;

DRIGO, AV .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (11) :5187-5189

[42] THE C49 TO C54 PHASE-TRANSFORMATION IN TISI2 THIN-FILMS [J].

MANN, RW ;

CLEVENGER, LA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (05) :1347-1350

[43] ELECTRICAL TRANSPORT AND INSITU X-RAY STUDIES OF THE FORMATION OF TISI2 THIN-FILMS ON SI [J].

HENSEL, JC ;

VANDENBERG, JM ;

UNTERWALD, FC ;

MAURY, A .

APPLIED PHYSICS LETTERS, 1987, 51 (14) :1100-1102

[44] TiSi2 phase transformation by amorphization techniques [J].

Karlin, T ;

Samuelsson, M ;

Nygren, S ;

Ostling, M .

THIN FILMS - STRUCTURE AND MORPHOLOGY, 1997, 441 :283-288

[45] Properties of ferroelectric Pb(Zr, Ti)O3 thin films on TiSi2/Si substrates [J].

Hatano, Hitoshi, 1600, JJAP, Minato-ku, Japan (34)

[46] AN ELLIPSOMETRIC AND RBS STUDY OF TISI2 FORMATION [J].

DENIJS, JMM ;

VANSILFHOUT, A .

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1990, 5 (02) :319-323

[47] Synthesis of TiN, Ti, and TiSi2 Thin Films for the Contact System of Solar Cells [J].

K. Kh. Nussupov ;

N. B. Beisenkhanov ;

D. I. Bakranova ;

S. Keinbay ;

A. A. Turakhun ;

A. A. Sultan .

Physics of the Solid State, 2020, 62 :48-53

[48] MODELING OF AGGLOMERATION IN POLYCRYSTALLINE THIN-FILMS - APPLICATION TO TISI2 ON A SILICON SUBSTRATE [J].

NOLAN, TP ;

SINCLAIR, R ;

BEYERS, R .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (02) :720-724

[49] THE METASTABLE C49 STRUCTURE IN SPUTTERED TISI2 THIN-FILMS [J].

BRETSCHNEIDER, W ;

BEDDIES, G ;

SCHOLZ, R .

THIN SOLID FILMS, 1988, 158 (02) :255-263

[50] Modeling of agglomeration in polycrystalline thin films. Application to TiSi2 on a silicon substrate [J].

1600, (71)

← 1 2 3 4 5 →