The modification of amido on the surface of the diamond film deposited by HFCVD

被引：0
|
作者：
An, Yun-Ling [1 ]
Chang, Ming [1 ]
机构：
[1] Tianjin Key Laboratory of Film Electronics and Communication Devices, Department of Electronics Information Engineering, Tianjin University of Technology, Tianjin 300384, China
来源：
Gongneng Cailiao/Journal of Functional Materials | 2010年 / 41卷 / 01期
关键词：
X ray photoelectron spectroscopy - Chemical vapor deposition - Diamond films - Functional materials;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Diamond is some one kind of functional material that combines many kinds of fineness in itself, but the high stability of the structures of sp3 Carbon bonds in the diamond film makes it difficult to form active surface so as to meet the needs as functional surface. This paper summarized a new chemical modification method to introduce amido groups on the surface of the diamond film. The modified surface was characterized by XPS (X-ray photoelectron spectroscopy). The results indicate that the amido groups have been modified on the surface of the diamond film successfully. Finally the application of the amido groups modified diamond surface is discussed briefly.
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页码：73 / 75
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