Numerical simulation of the chemical vapor deposition of polycrystalline silicon in a trichlorosilane and hydrogen system

被引：0

作者：

Zhang, Pan ^{[1
]}

Wang, Wei-Wen ^{[2
]}

Dong, Hai-Hong ^{[2
]}

Wu, Yu-Lei ^{[2
]}

Chen, Guang-Hui ^{[2
]}

Li, Jian-Long ^{[2
]}

机构：

[1] College of Electronmechanical Engineering, Qingdao University of Science and Technology, Qingdao 266061, China

[2] College of Chemical Engineering, Qingdao University of Science and Technology, Qingdao 266043, China

来源：

Rengong Jingti Xuebao/Journal of Synthetic Crystals | 2010年 / 39卷 / 02期

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摘要：

引用

页码：494 / 499