By-product generation through electrical discharge in CF3I gas and its effect to insulation characteristics

被引:0
|
作者
Department of Electrical Engineering and Information Systems, University of Tokyo, 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, Japan [1 ]
机构
来源
IEEJ Trans. Power Energy | / 10卷 / 859-864期
关键词
Compendex;
D O I
暂无
中图分类号
学科分类号
摘要
Sulfur hexafluoride
引用
收藏
相关论文
共 37 条
  • [31] Adsorption mechanism and compatibility of environmentally friendly insulating gas CF3I and its main decomposition products with Al and Cu(111) surfaces
    Liu, Wei
    Song, Yumei
    Guo, Yuzheng
    Han, Rong
    Zheng, Yu
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2024, 57 (17)
  • [32] Numerical Study on Comparison of Negative and Positive Surface Discharge in c-C4F8/CF3I/CO2 Gas Mixture
    Fan B.
    Zhou X.
    Qian Y.
    Zang Y.
    Journal of Shanghai Jiaotong University (Science), 2024, 29 (02) : 202 - 215
  • [33] The effect of a buffer (acceptor) gas on the yield of products in isotropically selective IR multiple-photon dissociation of CF3I molecules in a pulse gasdynamic flow
    Makarov, GN
    Lokhman, VN
    Malinovskii, DE
    Ogurok, DD
    CHEMICAL PHYSICS REPORTS, 1999, 18 (03): : 539 - 553
  • [34] The effect of a buffer (acceptor) gas on the yield of products in isotropically selective IR multiple- photon dissociation of CF3I molecules in a pulse gasdynamic flow
    Makarov, G.N.
    Lokhman, V.N.
    Malinovskii, D.E.
    Ogurok, D.D.
    Chemical Physics Reports, 18 (03): : 539 - 553
  • [35] A Prototype of Electric Discharge Gas-Flow Oxygen–Iodine Laser: 2. Simulation of the Parameters of the Active Medium Formed in a Gas-Flow Slab RF Discharge in O2 : He : CF3I Mixtures
    N. P. Vagin
    A. A. Ionin
    A. Yu. Kozlov
    I. V. Kochetov
    A. P. Napartovich
    O. A. Rulev
    D. V. Sinitsyn
    N. N. Yuryshev
    Plasma Physics Reports, 2020, 46 : 1114 - 1123
  • [36] A Prototype of Electric Discharge Gas-Flow Oxygen-Iodine Laser: 2. Simulation of the Parameters of the Active Medium Formed in a Gas-Flow Slab RF Discharge in O2 : He : CF3I Mixtures
    Vagin, N. P.
    Ionin, A. A.
    Kozlov, A. Yu.
    Kochetov, I. V.
    Napartovich, A. P.
    Rulev, O. A.
    Sinitsyn, D. V.
    Yuryshev, N. N.
    PLASMA PHYSICS REPORTS, 2020, 46 (11) : 1114 - 1123
  • [37] Electron population above 13.5 eV in ultrahigh frequency and inductively coupled plasmas through C2F4/CF3I and C4F8/Ar gas mixtures
    Nakano, T
    Samukawa, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 2774 - 2779