Numerical simulation of OH radical in dielectric barrier discharge plasma

被引：0
|
作者：
Xu, Yong [1 ]
Wang, Li-Na [1 ]
Liu, Zhong-Wei [1 ]
Zhu, Ai-Min [1 ]
Zhao, Guo-Li [1 ]
机构：
[1] Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China
来源：
Dalian Ligong Daxue Xuebao/Journal of Dalian University of Technology | 2010年 / 50卷 / 05期
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页码：625 / 630
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