Repetition rate pulsed power technology and its applications: (i) Introduction

被引:10
作者
Jiang, Weihua [1 ]
机构
[1] Department of Electrical Engineering, Tsinghua University
来源
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2012年 / 24卷 / 01期
关键词
Gas discharge; High voltage; High-power pulsed switch; Power electronics; Pulsed power; Short pulse;
D O I
10.3788/HPLPB20122401.0010
中图分类号
学科分类号
摘要
This is the first of a series of review papers on repetitive pulsed power technology. It gives general description about the technological characteristics such as high number of working-cycles, short time interval, and high average power. Typical applications in excimer laser, atmospheric gas discharge, and high-energy accelerator are introduced in order to highlight the significance of the technology. Repetitive pulsed power technology will be further developed mainly in the direction of short pulse and waveform control, while operation parameters of practical generators for specific applications will be pushed to the component limit. Future development of repetitive pulsed power and related technologies will bring more benefits into industrial and civil areas.
引用
收藏
页码:10 / 15
页数:5
相关论文
共 13 条
[1]  
Neau E.L., Environmental and industrial applications of pulsed power systems, IEEE Trans on Plasma Science, 22, pp. 2-10, (1994)
[2]  
Jiang W., Yatsui K., Takayama K., Et al., Compact solid state-switched pulsed power and its applications, Proc of the IEEE, 92, 7, pp. 1180-1196, (2004)
[3]  
Akiyama H., Sakugawa T., Namihira T., Et al., Industrial applications of pulsed power technology, IEEE Trans on Dielectrics and Electrical Insulation, 14, 5, pp. 1051-1064, (2007)
[4]  
Mankowski J., Kristiansen M., A review of short pulse generator technology, IEEE Trans on Plasma Science, 28, 1, pp. 102-108, (2000)
[5]  
Buttram M., Some future directions for repetitive pulsed power, IEEE Trans on Plasma Science, 30, 1, pp. 262-266, (2002)
[6]  
Ogawa K., Sasago M., Endo M., Et al., A KrF excimer laser lithography for half micron devices, Jpn J Appl Phys, 27, 8, pp. 1521-1525, (1988)
[7]  
Kakizaki K., Sasaki Y., Inoue T., Et al., High-repetition-rate (6 kHz) and long-pulse-duration (50 ns) ArF excimer laser for sub-65 nm lithography, Review of Scientific Instruments, 77, (2006)
[8]  
Nagai S., Takehisa K., Enami T., Et al., Development of a 2 kHz F <sub>2</sub> laser for 157 nm lithography, Jpn J Appl Phys, 38, 12 B, pp. 7013-7016, (1999)
[9]  
Wood O., Extreme ultraviolet lithography development in the United States, Jpn J Appl Phys, 45, 6 B, pp. 5349-5353, (2006)
[10]  
Smulders E.H.W.M., van Heesch B.E.J.M., van Paasen S.S.V.B., Pulsed power corona discharges for air pollution control, IEEE Trans on Plasma Science, 26, 5, pp. 1476-1484, (1998)