Effect of sputtering current on the structure and properties of CrNx films deposited by magnetron sputtering

被引：0
|
作者：
Kong, Qing-Hua [1 ,2 ]
Ji, Li [1 ]
Li, Hong-Xuan [1 ]
Liu, Xiao-Hong [1 ]
Chen, Jian-Min [1 ]
Zhou, Hui-Di [1 ]
机构：
[1] State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China
[2] Graduate University of Chinese Academy of Sciences, Beijing 100049, China
来源：
Gongneng Cailiao/Journal of Functional Materials | 2010年 / 41卷 / 12期
关键词：
Microstructure - Chromium alloys - Scanning electron microscopy - Energy dispersive X ray analysis - Silicon wafers - Magnetron sputtering - X ray diffraction;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：2202 / 2205
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