Fabrication process of antimony telluride and bismuth telluride micro thermoelectric generator

被引：0

作者：

Mizoshiri, Mizue ^{[1
]}

Mikami, Masashi ^{[2
]}

Ozaki, Kimihiro ^{[2
]}

机构：

[1] Department of Micro-Nano Systems Engineering, Graduate School of Engineering, Nagoya University, Furo-ch, Chikusa-ku, Nagoya, 464-8603, Aichi

[2] Inorganic Functional Materials Research Institute, National Institute of Advanced Industrial Science and Technology, 2266-98 Anagahora, Moriyama-ku, Nagoya, 463-8560, Aichi

来源：

International Journal of Automation Technology | 2015年 / 9卷 / 06期

关键词：

Bismuthtelluride film; Lift-off process; Lithography; Micro thermoelectric generator; Sputtering;

D O I：

10.20965/ijat.2015.p0612

中图分类号：

学科分类号：

摘要：

This paper describes the process of fabricating micro thermoelectric generators (μ-TEGs) based on antimony telluride (Sb-Te) and bismuth telluride (Bi-Te). These materials have excellent thermoelectric (TE) conversion properties. The deposition and patterning processes for thermoelectric films are key techniques in the fabrication of μ-TEGs. However, it is difficult to form TE micropatterns using conventional semiconductor technologies because Sb-Te and Bi-Te are brittle and difficult to etch. Therefore, a semiconductor fabrication process is developed for TE film patterning. Here, various processes for depositing Sb-Te and Bi-Te TE films are described. Then, the combinations of the deposition and patterning techniques are reviewed. Finally, the generation properties of the μ-TEGs are summarized. © 2015, Fuji Technology Press. All rights reserved.

引用

页码：612 / 618

页数：6

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