High-throughput characterization of thin film shape memory alloys

被引:0
作者
Aono, Yuko [1 ]
Kawaguchi, Ryutaro [2 ]
Sakurai, Junpei [3 ]
Hata, Seiichi [4 ]
机构
[1] Tokyo Institute of Technology, Meguro-ku, Tokyo 152-8552, 2-12-1 I6-21, Ookayama
[2] Tokyo Institute of Technology, Midori-ku, Yokohama 226-8503, 4259 J3-11, Nagatsuta-cho
[3] Tokyo Electron Ltd., Tsukuba-shi, Ibaraki 350-0841, 17, Miyukigaoka
[4] Nagoya University, Furo-cho, Chikusa-ku
关键词
Combinatorial technique; High-throughput characterization; Thin film shape memory alloys;
D O I
10.1541/ieejsmas.133.348
中图分类号
学科分类号
摘要
Thin film shape memory alloys (SMAs) are promising materials for micro-machines because of their high-output power, large strain, and actuation without high voltage. To search for compositions of suitable thin film SMAs for each application, combinatorial technique is useful tool, however the technique requires high-throughput characterization method for thermal property which is an important property of thin film SMAs such as two way martensitic transformation temperature and thermal hysteresis. In this paper, novel high-throughput characterization method for such properties using thermography is proposed and demonstrated. Compositionally integrated thin film SMA samples (TiNiPd) with only 1mm2 of each area are characterized at once. The difference of martensitic and reverse martensitic transformation temperature against those temperatures measured by a conventional method, differential scanning calorimetry, is about 5K. © 2013 The Institute of Electrical Engineers of Japan.
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页码:348 / 353+5
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