Study of mechanical polishing of CVD diamond thick films

被引：0
|
作者：
Yan, Zhaohui [1 ]
Wang, Jianhua [1 ]
Man, Weidong [1 ]
Xiong, Jun [1 ]
机构：
[1] Province Key Laboratory of Plasma Chemical and Advanced Materials, Wuhan Institute of Technology, Wuhan 430073, China
来源：
Jingangshi yu Moliao Moju Gongcheng/Diamond and Abrasives Engineering | 2007年 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Diamond films prepared by Chemical Vapor Deposition (CVD) usually have a very rough surface and uneven thickness and should be polished before application. In this paper, we investigated the polishing effects of CVD diamond films using different sizes diamond powder and introduced a high quality and efficient polishing method, that is to polish the CVD diamond film first with diamond powder of W40 and W28 for 2 hours, then continue the polishing with diamond powder of W0.5 for 4 hours. The Scanning Electron Microscope (SEM) and Atomic Force Microscopy (AFM) test results of the polished diamond film show that the average removal rate of the diamond film is 12.2 μm/h and the surface roughness is decreased from 4.60 μm to 3.06 nm by this method. The experiment results also show that it's a high quality and efficient polishing method for CVD diamond films.
引用
收藏
页码：32 / 35
相关论文
共 50 条
  • [1] Study on EDM polishing of CVD diamond films
    Lu, W. Z.
    Zu, D. W.
    Wang, M.
    Xu, F.
    Li, X. F.
    ADVANCES IN MACHINING & MANUFACTURING TECHNOLOGY VIII, 2006, 315-316 : 464 - 468
  • [2] Polishing of CVD diamond films
    Guo, ZN
    Wang, CY
    Zhang, FL
    Kuang, TC
    ADVANCES IN ABRASIVE PROCESSES, 2001, 202-2 : 165 - 170
  • [3] An oxidation enhanced mechanical polishing technique for CVD diamond films
    Cheng, CY
    Tsai, HY
    Wu, CH
    Liu, PY
    Hsieh, CH
    Chang, YY
    DIAMOND AND RELATED MATERIALS, 2005, 14 (3-7) : 622 - 625
  • [4] Study on mechanical polishing for CVD diamond films of forming nucleus surface and growing surface
    Chen, Rongfa
    Zuo, Dunwen
    Lu, Wenzhuang
    Li, Duosheng
    Xu, Feng
    Ji, Tong
    Wang, Min
    ADVANCES IN GRINDING AND ABRASIVE TECHNOLOGY XIV, 2008, 359-360 : 285 - 289
  • [5] Thermochemical polishing of CVD diamond films
    Fern Universitaet Hagen, Hagen, Germany
    Diamond Relat Mater, 8 (1108-1117):
  • [6] Polishing of CVD Diamond Wafers and Films
    Feng, Haibo
    Chen, Yiqing
    Zhang, L. C.
    MATERIALS SCIENCE AND NANOTECHNOLOGY I, 2013, 531-532 : 373 - 376
  • [7] Thermochemical polishing of CVD diamond films
    Zaitsev, AM
    Kosaca, G
    Richarz, B
    Raiko, V
    Job, R
    Fries, T
    Fahrner, WR
    DIAMOND AND RELATED MATERIALS, 1998, 7 (08) : 1108 - 1117
  • [8] Polishing of CVD diamond films in vacuum
    Ma, Yongtao
    Li, Yanmin
    He, Zhanshu
    Manufacturing Technology, 2015, 15 (02): : 177 - 183
  • [9] Plasma-Etching Enhanced Mechanical Polishing for CVD Diamond Films
    郊先锋
    马志斌
    吴振辉
    何艾华
    江建华
    袁松柳
    Plasma Science and Technology, 2008, (03) : 336 - 339
  • [10] Plasma-etching enhanced mechanical polishing for CVD diamond films
    Zheng Xianfeng
    Ma Zhibin
    Wu Zhenhui
    He Aihua
    Wang Jianhua
    Yuan Songliu
    PLASMA SCIENCE & TECHNOLOGY, 2008, 10 (03) : 336 - 339
12345