Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering

被引:0
|
作者
Zhang, Wenjie [1 ,2 ]
Wang, Kuanling [1 ]
Zhu, Shenglong [2 ]
Li, Ying [2 ]
Wang, Fuhui [2 ]
He, Hongbo [3 ]
机构
[1] School of Environmental and Chemical Engineering, Shenyang Ligong University, Shenyang Hun-Nan, Shenyang 110168, China
[2] State Key Laboratory for Corrosion and Protection, Institute of Metal Research, The Chinese Academy of Sciences, Shenyang, 110016, China
[3] Institute of Applied Ecology, The Chinese Academy of Sciences, Shenyang, 110016, China
来源
Chemical Engineering Journal | 2009年 / 155卷 / 1-2期
关键词
Degradation;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
页码:83 / 87
相关论文
共 50 条
  • [41] DC REACTIVE MAGNETRON SPUTTERING OF TITANIUM-STRUCTURAL AND OPTICAL CHARACTERIZATION OF TIO2 FILMS
    SUHAIL, MH
    RAO, GM
    MOHAN, S
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (03) : 1421 - 1427
  • [42] Structural and optical properties of TiO2 films prepared using reactive RF magnetron sputtering
    Jeong, SH
    Kim, BS
    Lee, BT
    Park, HR
    Kim, JK
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2002, 41 (01) : 67 - 71
  • [44] Characterization of rutile N-doped TiO2 films prepared by RF magnetron sputtering
    Dobromir, Marius
    Manole, Alina-Vasilica
    Rebegea, Simina
    Apetrei, Radu
    Neagu, Maria
    Luca, Dumitru
    MATERIALS AND APPLICATIONS FOR SENSORS AND TRANSDUCERS II, 2013, 543 : 277 - +
  • [45] Microstructural evolution and optical properties of doped TiO2 films prepared by RF magnetron sputtering
    Wang, SF
    Hsu, YF
    Lee, YS
    CERAMICS INTERNATIONAL, 2006, 32 (02) : 121 - 125
  • [46] TiO2/CuO/Cu2O Photovoltaic Nanostructures Prepared by DC Reactive Magnetron Sputtering
    Wisz, Grzegorz
    Sawicka-Chudy, Paulina
    Sibinski, Maciej
    Ploch, Dariusz
    Bester, Mariusz
    Cholewa, Marian
    Wozny, Janusz
    Yavorskyi, Rostyslav
    Nykyruy, Lyubomyr
    Ruszala, Marta
    NANOMATERIALS, 2022, 12 (08)
  • [47] NANOSTRUCTURE OF TiO2 THIN FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING
    Pokaipisit, Artorn
    Chaiyakun, Surasing
    Limsuwan, Pichet
    Ngotawornchai, Boonlaer
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2009, 23 (10): : 2395 - 2403
  • [48] Characterization of CuAlO2 films prepared by dc reactive magnetron sputtering
    Reddy, A. Sivasankar
    Reddy, P. Sreedhara
    Uthanna, S.
    Rao, G. Mohan
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2006, 17 (08) : 615 - 620
  • [49] Characterization of CuAlO2 films prepared by dc reactive magnetron sputtering
    A. Sivasankar Reddy
    P. Sreedhara Reddy
    S. Uthanna
    G. Mohan Rao
    Journal of Materials Science: Materials in Electronics, 2006, 17 : 615 - 620
  • [50] Continuous and Nanostructured TiO2 Films Grown by dc Sputtering Magnetron
    Sanchez, O.
    Vergara, L.
    Climent Font, A.
    de Melo, O.
    Sanz, R.
    Hernandez-Velez, M.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2012, 12 (12) : 9148 - 9155