An efficient and flat-gain Erbium-doped fiber amplifier in the region of 1550 nm to 1590 nm

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作者
Department of Electrical Engineering, University of Malaya, Kuala Lumpur 50603, Malaysia [1 ]
不详 [2 ]
不详 [3 ]
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Opto. Adv. Mat. Rap. Comm. | 2008年 / 8卷 / 455-458期
关键词
Cutoff wavelengths - Flat-gain - High concentration EDF - L-band EDFA - Modified chemical vapor depositions - Population inversions - Solution-doping technique - Two-level system;
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摘要
A flat gain erbium-doped fiber amplifier (EDFA) operating in the 1550 nm to 1590 nm region is demonstrated. The EDFA uses only a15m EDF as opposed to a standard L-band EDFA which requires significantly longer EDF lengths. The EDF is fabricated using a Modified Chemical Vapor Deposition process in conjunction with a solution doping technique. The NA, cut-off wavelength and erbium ion concentration of the fiber are obtained at 0.15, 998 nm and 900 ppm respectively. The gain of the EDFA is flattened to a level of about 12 dB with a gain variation of less than 3 dB over a range from 1550 to 1590 nm with a 1480nm pump at 90mW. This amplifier operates on the energy transfer of the quasi-two-level system, whereby the C-band energy acts as a pump for the population inversion required for gain at the longer wavelength. The noise figure at the flat gain region varies from 6 to 8.5 dB.
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