Characterization of Line-Edge roughness in Cu/Low-k interconnect pattern

被引：0

作者：

Yamaguchi, Atsuko ^{[1
]}

Ryuzaki, Daisuke ^{[1
]}

Takeda, Ken-Ichi ^{[1
]}

Yamamoto, Jiro ^{[1
]}

Kawada, Hiroki ^{[2
]}

Iizumi, Takashi ^{[2
]}

机构：

[1] Central Research Laboratory, Hitachi Ltd., Higashikoigakuho, Kokubunji, Tokyo 185-8601, Japan

[2] Hitachi High-Technologies Corp., Ichige, Hitachinaka, Ibaraki 312-8504, Japan

来源：

Japanese Journal of Applied Physics | 2008年 / 47卷 / 4 PART 2期

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摘要：

Journal article (JA)

引用

页码：2501 / 2505

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