Variations in contrast of scanning electron microscope images for microstructure analysis of Si-based semiconductor materials

被引：0

作者：

Itakura, Masaru ^{[1
]}

Kuwano, Noriyuki ^{[1
,2
]}

Sato, Kaoru ^{[3
]}

Tachibana, Shigeaki ^{[4
]}

机构：

[1] Department of Applied Science for Electronics and Materials, Fukuoka, Kasuga,816-8580, Japan

[2] Art, Science and Technology Center for Cooperative Research, Kyushu University, Fukuoka, Kasuga,816-8580, Japan

[3] Steel Research Laboratory, JFE Steel Corporation, Kanagawa, Kawasaki,210-0855, Japan

[4] Yokohama Demonstration Laboratory, SII Nano Technology, Inc., Kanagawa, Yokohama,226-0006, Japan

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关键词：

Compendex;

D O I：

暂无

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学科分类号：

摘要：

Scanning electron microscopy

引用