共 50 条
- [41] Accumulation effect of SiO2 protective layer on multi-shot laser-induced damage in high-reflectivity HfO2/SiO2 coatingsChineseOpticsLetters, 2011, 9 (10) : 94 - 97论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:赵元安论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Materials for High Power Lasers,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences Key Laboratory of Materials for High Power Lasers,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:
- [42] Accumulation effect of SiO2 protective layer on multi-shot laser-induced damage in high-reflectivity HfO2/SiO2 coatingsCHINESE OPTICS LETTERS, 2011, 9 (10)Wang, Ying论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R ChinaHe, Hongbo论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R ChinaZhao, Yuan'an论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R ChinaShan, Yongguang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R ChinaWei, Chaoyang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China
- [43] Mechanism for defect dependence of damage morphology in HfO2/SiO2 high reflectivity coating under nanosecond ultraviolet laser irradiationOPTIK, 2014, 125 (18): : 5323 - 5326Yu, Zhenkun论文数: 0 引用数: 0 h-index: 0机构: Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China Chinese Acad Sci, Grad Sch, Beijing, Peoples R China Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R ChinaHe, Hongbo论文数: 0 引用数: 0 h-index: 0机构: Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R ChinaHe, Kai论文数: 0 引用数: 0 h-index: 0机构: Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China Chinese Acad Sci, Grad Sch, Beijing, Peoples R China Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R ChinaQi, Hongji论文数: 0 引用数: 0 h-index: 0机构: Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R ChinaWei, Sun论文数: 0 引用数: 0 h-index: 0机构: Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China Chinese Acad Sci, Grad Sch, Beijing, Peoples R China Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R ChinaChen, Shunli论文数: 0 引用数: 0 h-index: 0机构: Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China Chinese Acad Sci, Grad Sch, Beijing, Peoples R China Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai, Peoples R China
- [44] Investigation on picosecond laser-induced damage in HfO2/SiO2 high-reflective coatingsOPTICS AND LASER TECHNOLOGY, 2018, 106 : 372 - 377Li, Cheng论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaZhao, Yuan'an论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Beijing, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaCui, Yun论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaWang, Yueliang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaPeng, Xiaocong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaShan, Chong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Changchun Univ Sci & Technol, Changchun 130022, Jilin, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaZhu, Meiping论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaWang, Jianguo论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R ChinaShao, Jianda论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Lab Thin Film Opt, Shanghai 201800, Peoples R China
- [45] Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectorsAPPLIED OPTICS, 2011, 50 (09) : C357 - C363Cheng, Xinbin论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaShen, Zhengxiang论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaJiao, Hongfei论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaZhang, Jinlong论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaMa, Bin论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaDing, Tao论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaLu, Jiangtao论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaWang, Xiaodong论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R ChinaWang, Zhanshan论文数: 0 引用数: 0 h-index: 0机构: Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China
- [46] Role of nano-precursors in ultraviolet-laser damage of HfO2/SiO2 mixture coatingsTHIN SOLID FILMS, 2021, 739Zhou, Qiang论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaMa, Ping论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaQiu, Fuming论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaPu, Yunti论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaQiao, Zhao论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaLv, Liang论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaZhang, Mingxiao论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaKong, Pengfei论文数: 0 引用数: 0 h-index: 0机构: China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaQiu, Rong论文数: 0 引用数: 0 h-index: 0机构: Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R ChinaJiang, Yong论文数: 0 引用数: 0 h-index: 0机构: Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Sichuan, Peoples R China China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Sichuan, Peoples R China
- [47] Study of the picosecond laser damage in HfO2/SiO2 -based thin-film coatings in vacuumLASER-INDUCED DAMAGE IN OPTICAL MATERIALS 2016, 2016, 10014Kozlov, A. A.论文数: 0 引用数: 0 h-index: 0机构: Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USAPapernov, S.论文数: 0 引用数: 0 h-index: 0机构: Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USAOliver, J. B.论文数: 0 引用数: 0 h-index: 0机构: Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USARigatti, A.论文数: 0 引用数: 0 h-index: 0机构: Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USATaylor, B.论文数: 0 引用数: 0 h-index: 0机构: Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USACharles, B.论文数: 0 引用数: 0 h-index: 0机构: Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USASmith, C.论文数: 0 引用数: 0 h-index: 0机构: Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA Univ Rochester, Laser Energet Lab, 250 East River Rd, Rochester, NY 14623 USA
- [48] Modulation of electron transfer in Si/SiO2/HfO2/Graphene by the HfO2 thicknessAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2020, 126 (09):Ben Maad, Y.论文数: 0 引用数: 0 h-index: 0机构: Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, Tunisia Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, TunisiaDurnez, A.论文数: 0 引用数: 0 h-index: 0机构: Ctr Nanosci & Nanotechnol C2N, Palaiseau, France Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, Tunisia论文数: 引用数: h-index:机构:Madouri, A.论文数: 0 引用数: 0 h-index: 0机构: Ctr Nanosci & Nanotechnol C2N, Palaiseau, France Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, TunisiaOueslati, M.论文数: 0 引用数: 0 h-index: 0机构: Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, Tunisia Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, TunisiaMeftah, A.论文数: 0 引用数: 0 h-index: 0机构: Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, Tunisia Univ Tunis El Manar, Lab Nanomat Nanotechnol & Energy 2NE, Fac Sci Tunis, Tunis 2092, Tunisia
- [49] Modulation of electron transfer in Si/SiO2/HfO2/Graphene by the HfO2 thicknessApplied Physics A, 2020, 126Y. Ben Maad论文数: 0 引用数: 0 h-index: 0机构: University of Tunis El Manar,Faculty of Sciences of Tunis, Laboratory of Nanomaterials Nanotechnology and Energy (2NE)A. Durnez论文数: 0 引用数: 0 h-index: 0机构: University of Tunis El Manar,Faculty of Sciences of Tunis, Laboratory of Nanomaterials Nanotechnology and Energy (2NE)H. Ajlani论文数: 0 引用数: 0 h-index: 0机构: University of Tunis El Manar,Faculty of Sciences of Tunis, Laboratory of Nanomaterials Nanotechnology and Energy (2NE)A. Madouri论文数: 0 引用数: 0 h-index: 0机构: University of Tunis El Manar,Faculty of Sciences of Tunis, Laboratory of Nanomaterials Nanotechnology and Energy (2NE)M. Oueslati论文数: 0 引用数: 0 h-index: 0机构: University of Tunis El Manar,Faculty of Sciences of Tunis, Laboratory of Nanomaterials Nanotechnology and Energy (2NE)A. Meftah论文数: 0 引用数: 0 h-index: 0机构: University of Tunis El Manar,Faculty of Sciences of Tunis, Laboratory of Nanomaterials Nanotechnology and Energy (2NE)
- [50] Thermal stability of a HfO2/SiO2 interfaceAPPLIED PHYSICS LETTERS, 2006, 88 (10)Ikarashi, N论文数: 0 引用数: 0 h-index: 0机构: NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, Japan NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, JapanWatanabe, K论文数: 0 引用数: 0 h-index: 0机构: NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, Japan NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, JapanMasuzaki, K论文数: 0 引用数: 0 h-index: 0机构: NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, Japan NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, JapanNakagawa, T论文数: 0 引用数: 0 h-index: 0机构: NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, Japan NEC Corp Ltd, Syst Devices Res Labs, Sagamihara, Kanagawa 2291198, Japan