First-principles prediction of the electronic properties and contact features of graphene/γ-GeSe van der Waals heterostructure: effects of electric fields and strains

被引:0
|
作者
Vu, Tuan V. [1 ,2 ]
Kartamyshev, A. I. [1 ,2 ]
Lavrentyev, A. A. [3 ]
Hieu, Nguyen N. [4 ,5 ]
Phuc, Huynh V. [6 ]
Nguyen, Chuong V. [7 ,8 ]
机构
[1] Van Lang Univ, Inst Computat Sci & Artificial Intelligence, Lab Computat Phys, Ho Chi Minh City, Vietnam
[2] Van Lang Univ, Fac Mech Elect & Comp Engn, Sch Technol, Ho Chi Minh City, Vietnam
[3] Don State Tech Univ, Dept Elect Engn & Elect, 1 Gagarin Sq, Rostov Na Donu 344010, Russia
[4] Duy Tan Univ, Inst Res & Dev, Da Nang 550000, Vietnam
[5] Duy Tan Univ, Fac Nat Sci, Da Nang 550000, Vietnam
[6] Dong Thap Univ, Sch Educ, Div Phys, Cao Lanh 870000, Vietnam
[7] Le Quy Don Tech Univ, Dept Mat Sci & Engn, Hanoi 100000, Vietnam
[8] Le Quy Don Tech Univ, Ctr Mech & Mat Sci, Hanoi 100000, Vietnam
关键词
2-DIMENSIONAL MATERIALS; BAND ALIGNMENT; MOBILITY;
D O I
10.1039/d4ra06977c
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In this work, we investigate systematically the electronic properties and tunable contact behavior of the graphene/gamma-GeSe heterostructure under applied electric fields and out-of-plane strains using first-principles calculations. At equilibrium, the heterostructure forms a p-type Schottky contact with low Schottky barrier, making it suitable for low-resistance electronic devices. The application of electric fields modulates the Schottky barriers, enabling transitions between p-type and n-type contacts and even Schottky to Ohmic contact. Similarly, strain engineering by adjusting the interlayer spacing effectively alters the contact types, with compressive strain reducing the Schottky barrier to zero, and tensile strain inducing a shift from p-type to n-type Schottky contact. Our findings provide a pathway for optimizing graphene/gamma-GeSe heterostructures for multifunctional applications, emphasizing tunable electronic properties to enhance device performance.
引用
收藏
页码:37975 / 37983
页数:9
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