Properties of InGaAs deposited on GaAs substrate with two-step growth

被引:0
作者
Han, Zhi-Ming [1 ,2 ]
Miao, Guo-Qing [1 ]
Zeng, Yu-Gang [1 ]
Zhang, Zhi-Wei [1 ]
机构
[1] State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun
[2] University of Chinese Academy of Sciences, Beijing
来源
Faguang Xuebao/Chinese Journal of Luminescence | 2015年 / 36卷 / 03期
关键词
GaAs; InGaAs; MOCVD; Two step growth;
D O I
10.3788/fgxb20153603.0288
中图分类号
学科分类号
摘要
InxGa1-xAs was deposited on (100) GaAs substrate by MOCVD with the two-step growth. The effects of buffer layer thickness on the surface morphology, crystalline quality, and alloy order degree of the epilayer were analyzed by SEM, AFM, XRD, and Raman spectroscopy, respectively. The distribution of dislocations in epilayer was observed by TEM and the dislocation density was calculated. The experiment results show that the buffer layer thickness of InxGa1-xAs heterostructure has the optimal value. ©, 2015, Chines Academy of Sciences. All right reserved.
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页码:288 / 292
页数:4
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