Fabrication of carbon nanotubes by slot-excited microwave plasma-enhanced chemical vapor deposition

被引：0

作者：

Shim, Gyu Il ^{[1
]}

Kojima, Yoshihiro ^{[2
]}

Kono, Satoshi ^{[1
]}

Ohno, Yutaka ^{[2
]}

Ishijima, Tatsuo ^{[3
]}

机构：

[1] Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

[2] Department of Quantum Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagova 464-8603, Japan

[3] Plasma Nanotechnology Research Center, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

来源：

Japanese Journal of Applied Physics | 2008年 / 47卷 / 7 PART 1期

关键词：

Carbon nanotubes (CNTs) are fabricated by adopting plasma-enhanced chemical vapor deposition (PECVD) with a planar microwave plasma source. Plasma is produced by a slot antenna at 2.45-GHz microwave injection in CH 4/H2 mixture. In this study; it is shown that avoiding the exposure of the substrate to the plasma drastically improves the CNT growth. Furthermore; it is found that the CNT quality can be controlled with the optimization of one of the steps in the catalyst treatment; such as the preheating procedure; the treated catalyst is considered to be unaffected by the heating in the high-density microwave plasma treatment during the CNT growth. © 2008 The Japan Society of Applied Physics;

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摘要：

Journal article (JA)

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页码：5652 / 5655