Corrections of DC resistance on the start day of quantum hall resistance standard

被引：0
|
作者：
Tianjin University, Tianjin 300072, China [1 ]
不详 [2 ]
机构：
来源：
Jiliang Xuebao | 2008年 / 2卷 / 190-192期
关键词：
5;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] AUTOMATED QUANTUM HALL RESISTANCE STANDARD
    SCHUMACHER, B
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1995, 44 (02) : 199 - 200
  • [2] ON THE NIMT QUANTUM HALL RESISTANCE STANDARD
    Kurupakorn, C.
    Jassadajin, C.
    Charoensook, A.
    2010 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS CPEM, 2010, : 617 - 618
  • [3] Quantum Hall Effect as an Electrical Resistance Standard
    Boudinov, H.
    Boff, M. A. S.
    MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2011, 2011, 39 (01): : 31 - 36
  • [4] Quantum Hall Resistance Standard based on Graphene
    Janssen, T. J. B. M.
    Tzalenchuk, A.
    2010 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS CPEM, 2010, : 579 - 580
  • [5] The quantum Hall effect as an electrical resistance standard
    Jeckelmann, B
    Jeanneret, B
    QUANTUM HALL EFFECT: POINCARE SEMINAR 2004, 2005, 45 : 55 - 131
  • [6] The quantum Hall effect as an electrical resistance standard
    Jeckelmann, B
    Jeanneret, B
    REPORTS ON PROGRESS IN PHYSICS, 2001, 64 (12) : 1603 - 1655
  • [7] The quantum Hall effect as an electrical resistance standard
    Jeckelmann, B
    Jeanneret, B
    MEASUREMENT SCIENCE AND TECHNOLOGY, 2003, 14 (08) : 1229 - 1236
  • [8] Improvements in the Quantum Hall resistance standard at VTT
    Satrapinski, A
    Oja, AS
    Seppa, H
    1998 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS DIGEST, 1998, : 412 - 413
  • [9] THE REALIZATION OF THE QUANTUM HALL STANDARD OF RESISTANCE AT THE BIPM
    WITT, TJ
    ENDO, T
    REYMANN, D
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 1987, 36 (02) : 234 - 239
  • [10] Investigation of Serial Quantum Hall arrays as a Quantum Resistance Standard
    Koenemann, J.
    Leicht, C.
    Ahlers, F. -J.
    Pesel, E.
    Pierz, K.
    Schumacher, H. W.
    HORIBA INTERNATIONAL CONFERENCE: THE 19TH INTERNATIONAL CONFERENCE ON THE APPLICATION OF HIGH MAGNETIC FIELDS IN SEMICONDUCTOR PHYSICS AND NANOTECHNOLOGY, 2011, 334
12345