Deposition process and mechanical properties of (Ti, Al, Cr)N films deposited by multi arc ion plating

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作者：
Wang, Chuang [1 ]
Zhang, Jun [1 ]
机构：
[1] Shenyang University, Shenyang 110044, China
来源：
Weixi Jiagong Jishu/Microfabrication Technology | 2008年 / 05期
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页码：16 / 18
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