Effect of deposition temperature on the structural and physical properties of SrRuO3 films fabricated by magnetron sputtering

被引:0
作者
Wang, Kuan-Mao [1 ]
Zhang, Cang-Sheng [2 ]
Li, Man [1 ]
Zhou, Yang [1 ]
Wang, Yu-Qiang [1 ]
Wang, Xia [3 ]
Peng, Ying-Cai [3 ]
Liu, Bao-Ting [1 ]
机构
[1] College of Physics Science and Technology, Hebei University, Baoding 071002, China
[2] Center of Computer Science, Hebei University, Baoding 071002, China
[3] College of Electronic and Information Engineering, Hebei University, Baoding 071002, China
来源
Rengong Jingti Xuebao/Journal of Synthetic Crystals | 2010年 / 39卷 / 01期
关键词
Thin films - Film growth - Ruthenium compounds - X ray diffraction - Atomic force microscopy - Strontium titanates - Titanium compounds - Physical properties;
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摘要
SrRuO3 thin film was fabricated on (001) SrTiO3 substrate by RF magnetron sputtering method. Influences of deposition temperature on the structural and physical properties of SrRuO3 thin film were studied using X-ray diffraction (XRD), atomic force microscope (AFM) and four-probe tester. It was found that SrRuO3 thin film is polycrystalline when the deposition temperature is lower than 550°C, it is epitaxially grown on SrTiO3 substrate when the growth temperature ranges from 550 to 650°C, and the minimum resistivity of the SrRuO3 film is about 0.5 mΩ&middotcm.
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页码:135 / 138
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