Surface modification of uranium with chemical vapor deposited aluminum coatings

被引：0
作者：
Zhang, Yongbin [1 ]
Bin, Ren [1 ]
Lang, Dingmu [2 ]
Pu, Zhen [1 ]
机构：
[1] Science and Technology on Surface Physics and Chemistry Laboratory
[2] Academy of Engeering Physics
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2013年 / 33卷 / 11期
关键词：
Aluminium film; Anticorrosion; Chemical vapor deposition; Laser;
D O I：
10.3969/j.issn.1672-7126.2013.11.13
中图分类号：
学科分类号：
摘要：
The surfaces of metallic uranium were modified with Al coatings, grown by laser-assisted chemical vapor deposition (CVD), to increase its corrosion resistance. The impacts of the deposition conditions, including the laser irradiation, laser intensity, and type of Al source, on microstructures and corrosion resistance were evaluated. The Al coatings were characterized with X-ray diffraction, scanning electron microscopy, and Auger spectroscopy. The results showed that the Al-coating significantly enhances the corrosion resistance of the U surfaces, and that the maj or influencing factors are laser irradiation and its intensity. For example, the laser irradiation changed the CVD Al nano-spheres into a continuous film, and a laser energy below 100 mJ resulted in the fairly uniform, smooth, and compact Al coating. High laser intensity roughened the Al surface with different defects. The corrosion resistance of the laser assisted CVD Al-coating was found to be much higher than that of the conventional CVD Al-films.
引用
收藏
页码：1119 / 1123
页数：4
相关论文
共 11 条
  • [1] (1994)
  • [2] 33, 1, pp. 18-22, (2004)
  • [3] Orman S., The corrosion behavior of nickel-plated uranium, Corrosion Sci, 12, pp. 35-39, (1972)
  • [4] Weirick L.J., Protective coatings for uranium alloys: SLL-74-5213, (1974)
  • [5] Weirick L.J., Corrosion and protection of uranium alloy penetrators: SAND 75-8243, (1975)
  • [6] 30, 5, pp. 464-469, (2010)
  • [7] 30, 5, pp. 464-469, (2010)
  • [8] Hugh O., Pierson, Handbook of Chemical Vapor Deposition, pp. 34-89, (1999)
  • [9] Rogers B.R., Underlayer work function effect on nucleation and film morphology of chemical vapor deposited aluminum, Thin Solid Films, 408, pp. 87-96, (2002)
  • [10] Tsubouchi K., Masu K., Precursor design and selective aluminum CVD, Vacuum, 46, 11, pp. 1249-1253, (1995)
12