Study of electromigration-induced Cu consumption in the flip-chip SnCu solder bumps

被引：0

作者：

Liu, C.Y. ^{[1
]}

Ke, Lin ^{[1
]}

Chuang, Y.C. ^{[1
]}

Wang, S.J. ^{[1
]}

机构：

[1] Department of Chemical Engineering and Materials Engineering, Institute of Materials Science and Engineering, National Central University, Jhong-Li, 301, Taiwan

来源：

Journal of Applied Physics | 2006年 / 100卷 / 08期

关键词：

The Cu consumption in flip-chip SnCu solder joint structures; both with and without current stressing was studied. The Cu consumption activation energy without current stressing was determined to be 0.93 eV. With current stressing; the Cu consumption activation energy decreased to 0.66 eV. We believe that the enhancement of Cu consumption by current stressing is due to the electromigration (EM) Cu atoms dissolved in the Sn to electromigrate instantaneously toward the anode side; which means that the cathode's Cu-Sn compound layer dissolves into the Sn to satisfy the Cu solubility limit. The EM-induced Cu consumption is controlled by either the dissolution of the cathode Cu-Sn compound or by EM Cu flux in Sn. The temperature defines that the controlling step of Cu consumption was found and determined to be 129 °C by equating the dissolution flux in the Cu-Sn compound and the EM Cu flux in Sn. When the EM temperature is higher than the critical temperature; the Cu-Sn compound dissolution process controls the Cu consumption. In this case; a constant interfacial Cu-Sn compound thickness remains at the cathode interface; which is determined by the balance between the Cu-Sn compound dissolution and the chemical Cu flux. If the EM temperature is lower than the critical temperature; the EM Cu flux in the Sn controls the Cu consumption. The growth of Cu-Sn compound at cathode is controlled by the EM Cu flux in Sn and the chemical Cu flux. © 2006 American Institute of Physics;

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摘要：

Journal article (JA)

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