Influence of nanoscale structural features on the physical properties of DC reactive magnetron sputtered Zinc Aluminum Oxide (ZAO) thin films for photovoltaic applications

被引：0

作者：

Kumar, B. Rajesh ^{[1
,2
]}

Rao, T. Subba ^{[2
]}

机构：

[1] Sri Venkateswara Univ, Dept Phys, Tirupati 517502, Andhra Pradesh, India

[2] Sri Krishnadevarya Univ, Dept Phys, Mat Res Lab, Anantapur 515003, Andhra Pradesh, India

来源：

OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS | 2012年 / 6卷 / 11-12期

关键词：

DC magnetron reactive sputtering; ZAO films; Electrical properties; Optical properties; ZNO FILMS; OPTICAL-PROPERTIES; DEPOSITION;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Zinc Aluminum Oxide (ZAO) thin films were deposited on glass substrates by DC reactive magnetron sputtering technique. Studies on structural, morphological, electrical and optical properties with different thickness of films are discussed in detail. XRD patterns exhibits ZAO thin films had a diffraction peak corresponding to (0 0 2) preferred orientation with c-axis perpendicular to the substrate surface. The optical band gap of nanostructured ZAO thin films increases with increase of film thickness from 3.41 to 3.51 eV. The carrier concentration of ZAO thin films are in the range of 3.08 x 10(20) cm(-3) - 8.12 x 10(20) cm(-3).

引用

页码：1092 / 1096

页数：5