Structure design of cylindrical rotating magnetron sputtering cathode and simulation of its magnetic field

被引：0

作者：

Chen, Changqi ^{[1
]}

Mu, Huaipu ^{[1
]}

Liu, Tengfei ^{[1
]}

Qiu, Yibing ^{[1
]}

机构：

[1] Institute of Vacuum Science and Technology and Equipment, Hefei University of Technology

来源：

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2012年 / 32卷 / 10期

关键词：

Cylindrical rotating cathode; Magnetic field simulation; Magnetron sputtering; Structure design;

D O I：

10.3969/j.issn.1672-7126.2012.10.11

中图分类号：

学科分类号：

摘要：

The structure of the cylindrical rotating magnetron sputtering cathode and its magnetic field distribution were modeled, designed, and simulated in finite element method with software package ANSYS. The 2D distribution of the Bx component of the magnetic field on the target surfaces was evaluated in the simulation. Guided by the simulated results, the optimized magnetic field distribution was obtained by adjusting the geometry and alignment angles of the permanent magnets involved, and by installing the mobile magnetism baffle plates between the magnets and the target. Moreover, a novel type of the cylindrical rotating magnetron sputtering cathode, to be used in the thin film growth on industrial scale, was designed.

引用

页码：913 / 918

页数：5

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