High power 808 nm laser diode with 62% wall-plug efficiency

被引:0
|
作者
Li P. [1 ,2 ]
Jiang K. [1 ,2 ]
Zhang X. [1 ]
Tang Q. [1 ]
Xia W. [1 ,2 ]
Li S. [1 ,2 ]
Ren Z. [1 ]
Xu X. [1 ,2 ]
机构
[1] Shandong Huaguang Optoelectronics Co. Ltd., Jinan
[2] State Key Lab. of Crystal Material, Shandong University, Jinan
来源
Guangxue Xuebao/Acta Optica Sinica | 2011年 / 31卷 / SUPPL.1期
关键词
GaAsP/GaInP/AlGaInP; Low pressure metal organic chemical vapor deposition; Semiconductor laser; Wall-plug efficiency;
D O I
10.3788/AOS201131.s100308
中图分类号
学科分类号
摘要
Based on the analysis of energy loss in a laser diode, we optimize the structure of the laser diode and metal organic chemical vapor deposition (MOCVD) growth condition. By low pressure (LP) MOCVD, GaAsP/GaInP/AlGaInP strained quantum well large optical cavity structure is grown, and high power continuous wave (CW) 808 nm laser diode is fabricated. At 25°C under CW operation condition, an output power of 11.5 W is obtained at 10 A current, with the threshold current being 1.15 A. The wall-plug efficiency reaches 62%. With the operation current of 5.5 A at 40°C, less than 2% output power degenerates over 1000 h.
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