Molecular resists based on cholate derivatives for electron-beam lithography

被引：0

作者：

Shiono, Daiju ^{[1
]}

Hirayama, Taku ^{[1
]}

Kasai, Kohei ^{[1
]}

Hada, Hideo ^{[1
]}

Onodera, Junichi ^{[1
]}

Arai, Tadashi ^{[2
]}

Yamaguchi, Atsuko ^{[2
]}

Shiraishi, Hiroshi ^{[2
]}

Fukuda, Hiroshi ^{[2
]}

机构：

[1] New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan

[2] ULSI Research Department, Central Research Laboratory, Hitachi, Ltd., 1-280, Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2006年 / 45卷 / 6 B期

关键词：

Electron beam lithography;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

页码：5435 / 5439