In this study;
Ti/n-GaAs Schottky barrier diode has been fabricated by DC magnetron sputtering. The current-voltage;
capacitance-voltage;
and conductance-voltage characteristics of Ti/n-GaAs diode have been investigated in the temperature range of 80-320 K. The ideality factor and barrier height values have been calculated from the forward current-voltage characteristics. The variation of the diode parameters with the sample temperature has been attributed to the presence of the lateral inhomogeneities of the barrier height. The temperature dependent capacitance-voltage characteristics have been measured to calculate the carrier concentration;
diffusion potential;
barrier height;
and temperature coefficient of the barrier height (α = -0.65 meV K-1). The fact that the temperature coefficient of the barrier height changes from metal to metal has been ascribed to the chemical nature of the contact metal or metal electronegativity. © 2014 AIP Publishing LLC;