High energy electron radiation effect on Ni and Ti/4H-SiC Schottky barrier diodes at room temperature

被引:0
作者
Microelectronic School, Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China [1 ]
机构
[1] Microelectronic School, Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, Xidian University
来源
Chin. Phys. | 2009年 / 5卷 / 1931-1934期
关键词
Annealing effect; Electron radiation; Schottky barrier diode; Silicon carbide;
D O I
10.1088/1674-1056/18/5/034
中图分类号
学科分类号
摘要
This paper reports that Ni and Ti/4H-SiC Schottky barrier diodes (SBDs) were fabricated and irradiated with 1 MeV electrons up to a dose of 3.43 × 1014 e/cm2. After radiation, the Schottky barrier height B of the Ni/4H-SiC SBD increased from 1.20 eV to 1.21 eV, but decreased from 0.95 eV to 0.94 eV for the Ti/4H-SiC SBD. The degradation of B could be explained by interface states of changed Schottky contacts. The on-state resistance RS of both diodes increased with the dose, which can be ascribed to the radiation defects. The reverse current of the Ni/4H-SiC SBD slightly increased, but for the Ti/4H-SiC SBD it basically remained the same. At room temperature, B of the diodes recovered completely after one week, and the RS partly recovered. © 2009 Chin. Phys. Soc. and IOP Publishing Ltd.
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页码:1931 / 1934
页数:3
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