Investigation on the sand erosion of free-standing diamond films

被引：0
|
作者：
He, Qi
Zhang, Fenglei
Wei, Junjun
Guo, Huibin
Lu, Fanxiu
机构：
[1] Department of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China
[2] Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan 030024, China
来源：
Jingangshi yu Moliao Moju Gongcheng/Diamond and Abrasives Engineering | 2007年 / 04期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：8 / 12
相关论文
共 50 条
  • [1] Erosion of free-standing CVD diamond film
    Kim, JH
    Lim, DS
    DIAMOND AND RELATED MATERIALS, 1999, 8 (2-5) : 865 - 870
  • [2] Erosion of free-standing CVD diamond film
    Kim, J.-H.
    Lim, D.-S.
    Diamond and Related Materials, 1999, 8 (02): : 865 - 870
  • [3] The solid particle erosion of free-standing CVD diamond
    Davies, AR
    Field, JE
    WEAR, 2002, 252 (1-2) : 96 - 102
  • [4] Dielectric characterization of free-standing diamond films
    Zhang, HD
    Chen, GC
    Li, CM
    Tang, WZ
    Lü, FX
    CHINESE PHYSICS LETTERS, 2002, 19 (11) : 1695 - 1696
  • [5] Microstructure and texture in free-standing CVD diamond films
    Feng, H
    Zhu, H
    Mao, W
    Chen, L
    Lü, F
    ICOTOM 14: TEXTURES OF MATERIALS, PTS 1AND 2, 2005, 495-497 : 1365 - 1369
  • [6] Free-standing diamond films grown on cobalt substrates
    Neto, MA
    Fan, QH
    Pereira, E
    DIAMOND AND RELATED MATERIALS, 2001, 10 (3-7) : 316 - 321
  • [7] Texture analysis of CVD free-standing diamond films
    Chen, L
    Mao, WM
    Feng, HP
    Lu, FX
    TEXTURE AND ANISOTROPY OF POLYCRYSTALS II, 2005, 105 : 421 - 426
  • [8] Growth of Free-Standing Diamond Films on Stainless Steel
    满卫东
    汪建华
    张宝华
    白宇明
    Plasma Science & Technology, 2005, (04) : 2950 - 2952
  • [9] Growth of free-standing diamond films of hemispheric shells
    Huang, SM
    Hong, FCN
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (10): : 3151 - 3155
  • [10] Growth of free-standing diamond films on stainless steel
    Man, WD
    Wang, JH
    Zhang, BH
    Bai, YM
    PLASMA SCIENCE & TECHNOLOGY, 2005, 7 (04) : 2950 - 2952
12345