Effects of flexible substrate thickness on Al-induced crystallization of amorphous Ge thin films

被引：0
|
作者：
Oya, Naoki [1 ]
Toko, Kaoru [1 ]
Saitoh, Noriyuki [2 ]
Yoshizawa, Noriko [2 ]
Suemasu, Takashi [1 ]
机构：
[1] Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki,305-8573, Japan
[2] Electron Microscope Facility, TIA, AIST, 16-1 Onogawa, Tsukuba,305-8569, Japan
来源：
Thin Solid Films | 2015年 / 583卷
关键词：
Compendex;
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摘要：
Crystal orientation
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页码：221 / 225
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