Effects of flexible substrate thickness on Al-induced crystallization of amorphous Ge thin films

被引：0
|
作者：
Oya, Naoki [1 ]
Toko, Kaoru [1 ]
Saitoh, Noriyuki [2 ]
Yoshizawa, Noriko [2 ]
Suemasu, Takashi [1 ]
机构：
[1] Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki,305-8573, Japan
[2] Electron Microscope Facility, TIA, AIST, 16-1 Onogawa, Tsukuba,305-8569, Japan
来源：
Thin Solid Films | 2015年 / 583卷
关键词：
Compendex;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Crystal orientation
引用
收藏
页码：221 / 225
相关论文
共 50 条
  • [1] Effects of flexible substrate thickness on Al-induced crystallization of amorphous Ge thin films
    Oya, Naoki
    Toko, Kaoru
    Saitoh, Noriyuki
    Yoshizawa, Noriko
    Suemasu, Takashi
    THIN SOLID FILMS, 2015, 583 : 221 - 225
  • [2] Effects of flexible substrate thickness on Al-induced crystallization of amorphous Ge thin films
    Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki
    305-8573, Japan
    不详
    305-8569, Japan
    Thin Solid Films, 1 (221-225):
  • [3] Stress and microstructure evolution in Al-induced crystallization of amorphous Ge thin films
    Zhang, Weilin
    Ma, Fei
    Zhang, Tianwei
    Xu, Kewei
    THIN SOLID FILMS, 2011, 520 (02) : 708 - 711
  • [4] Effect of Ge/Al thickness on Al-induced crystallization of amorphous Ge layers on glass substrates
    Nakazawa, K.
    Toko, K.
    Saitoh, N.
    Yoshizawa, N.
    Usami, N.
    Suemasu, T.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 10, NO 12, 2013, 10 (12): : 1781 - 1784
  • [5] Crystalline Ge Thin Films on Glass by Al-Induced Crystallization
    Shervin, Kaveh
    Kharel, Khim
    Freundlich, Alexandre
    2016 IEEE 43RD PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2016, : 1091 - 1094
  • [6] Al-induced crystallization of amorphous Ge thin films on conducting layer coated glass substrates
    Nakazawa, Koki
    Toko, Kaoru
    Usami, Noritaka
    Suemasu, Takashi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (04)
  • [7] Impact of amorphous Ge thin layer at the amorphous Si/Al interface on Al-induced crystallization
    Suzuki, Hidehiro
    Usami, Noritaka
    Nomura, Akiko
    Shishido, Toetsu
    Nakajima, Kazuo
    Suemasu, Takashi
    JOURNAL OF CRYSTAL GROWTH, 2010, 312 (22) : 3257 - 3260
  • [8] Orientation Controlled Ge Thin Films on Glass by Al-Induced Crystallization
    Shervin, Kaveh
    Kharel, Khim
    Freundlich, Alexandre
    2017 IEEE 44TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC), 2017, : 1452 - 1454
  • [9] Temperature dependent Al-induced crystallization of amorphous Ge thin films on SiO2 substrates
    Toko, Kaoru
    Fukata, Naoki
    Nakazawa, Koki
    Kurosawa, Masashi
    Usami, Noritaka
    Miyao, Masanobu
    Suemasu, Takashi
    JOURNAL OF CRYSTAL GROWTH, 2013, 372 : 189 - 192
  • [10] Al-induced lateral crystallization of amorphous Si thin films by microwave annealing
    Rao Rui
    Xu Zhong-yang
    Zeng Xiang-bing
    Journal of Wuhan University of Technology-Mater. Sci. Ed., 2002, 17 (4): : 25 - 28
12345