GaN film fabrication by near-atmospheric plasma-assisted chemical vapor deposition

被引：0

作者：

Nagata, Takahiro ^{[1
]}

Sakuma, Yoshiki ^{[1
]}

Uehara, Tsuyoshi ^{[2
]}

Chikyow, Toyohiro ^{[1
]}

机构：

[1] National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan

[2] Sekisui Chemical Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan

来源：

Japanese Journal of Applied Physics, Part 2: Letters | 2007年 / 46卷 / 1-3期

关键词：

Thin films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

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