GaN film fabrication by near-atmospheric plasma-assisted chemical vapor deposition

被引:0
|
作者
Nagata, Takahiro [1 ]
Sakuma, Yoshiki [1 ]
Uehara, Tsuyoshi [2 ]
Chikyow, Toyohiro [1 ]
机构
[1] National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
[2] Sekisui Chemical Co., Ltd., Wadai, Tsukuba, Ibaraki 300-4292, Japan
来源
Japanese Journal of Applied Physics, Part 2: Letters | 2007年 / 46卷 / 1-3期
关键词
Thin films;
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摘要
Journal article (JA)
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