Simulation study on high frequency characteristics of X-band high power relative klystron amplifier

被引：0
|
作者：
Zhu, Danni [1 ]
Zhang, Jun [1 ]
Li, Wei [1 ]
Qi, Zumin [1 ]
机构：
[1] College of Opto-electric Science and Engineering, National University of Defense Technology, Changsha 410073, China
来源：
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2014年 / 26卷 / 02期
关键词：
13;
D O I：
10.3788/HPLPB201426.023006
中图分类号：
学科分类号：
摘要：
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