Ferromagnetic resonance linewidth in metallic thin films: Comparison of measurement methods

被引：0

作者：

Kalarickal, Sangita S. ^{[1
]}

Krivosik, Pavol ^{[1
,4
]}

Wu, Mingzhong ^{[1
]}

Patton, Carl E. ^{[1
]}

Schneider, Michael L. ^{[2
]}

Kabos, Pavel ^{[2
]}

Silva, T.J. ^{[2
]}

Nibarger, John P. ^{[3
]}

机构：

[1] Department of Physics, Colorado State University, Fort Collins, CO 80523

[2] National Institute of Standards and Technology, Boulder, CO 80305

[3] Sun Microsystems, One StorageTek Drive, Louisville, CO 80028

[4] Department of Electromagnetic Field Theory, Faculty of Electrical Engineering and Information Technology, Bratislava, Slovakia

来源：

Journal of Applied Physics | 2006年 / 99卷 / 09期

关键词：

Stripline; (SL); vector network analyzer (VNA); and pulsed inductive microwave magnetometer (PIMM) techniques were used to measure the ferromagnetic resonance (FMR) linewidth for a series of Permalloy films with thicknesses of 50 and 100 nm. The SL-FMR measurements were made for fixed frequencies from 1.5 to 5.5 GHz. The VNA-FMR and PIMM measurements were made for fixed in-plane fields from 1.6 to 8 kAm (20-100 Oe). The results provide a confirmation; lacking until now; that the linewidths measured by these three methods are consistent and compatible. In the field format; the linewidths are a linear function of frequency; with a slope that corresponds to a nominal Landau-Lifshitz phenomenological damping parameter α value of 0.007 and zero frequency intercepts in the 160-320 Am (2-4 Oe) range. In the frequency format; the corresponding linewidth versus frequency response shows a weak upward curvature at the lowest measurement frequencies and a leveling off at high frequencies. © 2006 American Institute of Physics;

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摘要：

Journal article (JA)

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