Effect of Mn doping on the electric and dielectric properties of ZnO epitaxial films

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作者
Oshio, T. [1 ]
Masuko, K. [1 ]
Ashida, A. [1 ]
Yoshimura, T. [1 ]
Fujimura, N. [1 ]
机构
[1] Graduate School of Engineering, Osaka Prefecture University, 1-1, Gakuen-cho, Naka-ku, Sakai, Osaka 599-8531, Japan
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Journal of Applied Physics | 2008年 / 103卷 / 09期
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The Mn doping effects on the electric and dielectric properties of ZnO epitaxial films were studied. To optimize the stoichiometry of undoped ZnO film prepared by pulsed laser deposition; we evaluated the intensity ratio of the optical emission from excited oxygen atoms (O*) and excited zinc atoms (Zn*) generated by ablating a ZnO ceramic target in plume. The leakage current of undoped ZnO film decreased with an increase of the ratio I (O777*) I (Zn335*). Mn doping of ZnO was also effective in decreasing the leakage current. The ZnO:4 at. % Mn had a very small leakage current; eight orders of magnitude less than that of undoped ZnO. With a Mn concentration above 4 at. %; on the other hand; the leakage current was increased. The activation energy in ZnO:Mn obtained from the temperature dependence of the ac conductivity revealed that oxygen vacancy was responsible for the large current at the Mn concentration below 2 at. %. For the sample with the Mn concentration of 2-3 at. %; dominant conduction in ZnO:Mn epitaxial films originated from the interstitial Zn. When the Mn concentration was above 4 at. %; the conduction was governed by the substitution of Zn atoms in the oxygen site. Impedance analysis revealed that the origin for large resistivity of ZnO:Mn films was not the ZnO/electrode interface but the bulky part of the films. © 2008 American Institute of Physics;
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