Effect of Annealing Temperature on Properties of Cu-Cr-O Thin Films Deposited by Sputtering Technology

被引：0
|
作者：
Zhao X. [1 ]
Zhang M. [2 ]
Bai P. [1 ]
Hou X. [1 ]
Liu F. [1 ]
Yan H. [2 ]
机构：
[1] College of Materials Science and Engineering, Inner Mongolia University of Technology, Hohhot
[2] College of Materials Science and Engineering, Beijing University of Technology, Beijing
来源：
Kuei Suan Jen Hsueh Pao/Journal of the Chinese Ceramic Society | 2019年 / 47卷 / 01期
关键词：
Annealing temperature; Copper-chromium-oxygen thin films; Film structural; Optoelectronic properties;
D O I：
10.14062/j.issn.0454-5648.2019.01.08
中图分类号：
学科分类号：
摘要：
Cu-Cr-O thin films were prepared by the RF magnetron sputtering technology on quartz substrates with a sintered CuCrO2 ceramic as a target. The influence of annealing temperature on the structural and optoelectronic properties of the Cu-Cr-O thin films was investigated. The X-ray diffraction analysis reveals that the Cu-Cr-Ofilm annealed at 973Khas a delafossite structure without other phases, and the crystallinity of the film increases with the increase of the annealing temperature. Based on the measurements by ultraviolet-visible spectroscopy and the electrical property, the optical transmittance increases and the conductivity decreases as the annealing temperature increases. The maximum optical transmittance and conductivity of the film annealed at 973-1273K are 50% and 0.12S/cm, respectively. The results by scanning electron microscopy indicate that presence of micro-cracks in the film could be the main reason for the decreased electrical conductivity. © 2019, Editorial Department of Journal of the Chinese Ceramic Society. All right reserved.
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页码：55 / 61
页数：6
相关论文
共 21 条
  • [1] Sofi A.H., Shah M.A., Asokan K., Structural, optical and electrical properties of ITO thin films, J Electron Mater, 47, 2, pp. 1344-1352, (2018)
  • [2] Misra P., Ganeshan V., Agrawal N., Low temperature deposition of highly transparent and conducting Al-doped ZnO films by RF magnetron sputtering, J Alloy Compd, 725, pp. 60-68, (2017)
  • [3] Gong L., Liu Y.Z., Liu F.Y., Et al., Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates, J Mater Sci: Mater El, 28, 8, pp. 6093-6098, (2017)
  • [4] Kawazoe H., Yanagi H., Ueda K., Et al., Transparent p-type conducting oxides: design and fabrication of p-n heterojunctions, MRS Bull, 25, 8, pp. 28-36, (2000)
  • [5] Tate J., Jayaraj M.K., Draeseke A.D., Et al., P-type oxides for use in transparent diodes, Thin Solid Films, 411, 1, pp. 119-124, (2002)
  • [6] Nagarajan R., Draeseke A.D., Sleight A.W., Et al., P-type conductivity in CuCr<sub>1-x</sub>Mg<sub>x</sub>O<sub>2</sub> films and powders, J Appl Phys, 89, 12, pp. 8022-8025, (2001)
  • [7] Li D., Fang X.D., Deng Z.H., Et al., Electrical, optical and structural properties of CuCrO<sub>2</sub> films prepared by pulsed laser deposition, J Phys D: Appl Phys, 40, 16, pp. 4912-4915, (2007)
  • [8] Sun H., Yazdi M.A.P., Sanchette F., Et al., Optoelectronic properties of delafossite structure CuCr<sub>0.93</sub>Mg<sub>0.07</sub>O<sub>2</sub> sputter deposited coatings, J Phys D: Appl Phys, 49, 18, (2016)
  • [9] Wu S.Z., Deng Z.H., Dong W.W., Et al., Effect of deposition atmosphere on the structure and properties of Mg doped CuCrO<sub>2</sub> thin films prepared by direct current magnetron sputtering, Thin Solid Films, 595, pp. 124-128, (2015)
  • [10] Yu R.S., Wu C.M., Characteristics of p-type transparent conductive CuCrO<sub>2</sub> thin films, Appl Surf Sci, 282, 10, pp. 92-97, (2013)
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