Effective creation of oxygen vacancies as an electron carrier source in tin-doped indium oxide films by plasma sputtering

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作者：
Luo, S.N. [1 ,2 ]
Kono, A. [1 ]
Nouchi, N. [1 ]
Shoji, F. [1 ]
机构：
[1] Graduate School of Engineering, Kyushu Kyoritsu University, Kitakyushu, Fukuoka 807-8585, Japan
[2] Liaoning Inst. of Technol., China
来源：
Journal of Applied Physics | 2006年 / 100卷 / 11期
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