Reduction in intermediate layer thickness of CoCrPt- SiO2 perpendicular recording media by using Ru- SiO2
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Takekuma, I.
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Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, JapanCentral Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan
Takekuma, I.
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Araki, R.
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Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, JapanCentral Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan
Araki, R.
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Igarashi, M.
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Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, JapanCentral Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan
Igarashi, M.
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Nemoto, H.
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Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, JapanCentral Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan
Nemoto, H.
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Tamai, I.
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Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, JapanCentral Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan
Tamai, I.
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Hirayama, Y.
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Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, JapanCentral Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan
Hirayama, Y.
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Hosoe, Y.
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Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, JapanCentral Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan
Hosoe, Y.
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机构:
[1] Central Research Laboratory, Hitachi, Ltd., 2880 Kozu, Odawara 256-8510, Japan