Growth and characterization of titanium oxides films deposited by electron beam evaporation

被引:0
|
作者
Lin, Zeng [1 ,2 ]
Wang, Yong [1 ]
Han, Yongchao [1 ]
Ba, Dechun [1 ]
Liu, Chunming [2 ]
机构
[1] Shool of Mechanical Engineering and Automation, Northeastern University, Shenyang 110004, China
[2] Shool of Materials and Metallurgy, Northeastern University, Shenyang 110004, China
来源
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2010年 / 30卷 / 04期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:401 / 404
相关论文
共 50 条
  • [1] Growth behavior of titanium boride films deposited on (100) Si by dual-electron-beam evaporation
    Lee, YK
    JOURNAL OF CRYSTAL GROWTH, 2001, 226 (04) : 521 - 528
  • [2] STUDY OF TITANIUM-NITROGEN FILMS DEPOSITED IN AN ELECTRON-BEAM EVAPORATION UNIT
    BROWN, JD
    GOVERS, MR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (05): : 2328 - 2335
  • [3] Growth and characterization of CdS polycrystalline films by electron beam evaporation
    Yang, Dingyu
    Zhen, Jiagui
    Zhu, Xinghua
    Wei, Zhaorong
    Yang, Jun
    Gao, Xiuying
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2009, 29 (04): : 427 - 430
  • [4] Characterization of magnesium fluoride thin films deposited by direct electron beam evaporation
    Dumas, L
    Quesnel, E
    Robic, JY
    Pauleau, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (02): : 465 - 469
  • [5] Titanium oxide films on Si(100) deposited by electron-beam evaporation at 250°C
    Jang, HK
    Whangbo, SW
    Kim, HB
    Im, KY
    Lee, YS
    Lyo, IW
    Whang, CN
    Kim, G
    Lee, HS
    Lee, JM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (03): : 917 - 921
  • [6] Properties of CdS films deposited by the electron beam evaporation technique
    Sivaramamoorthy, K.
    Bahadur, S. Asath
    Kottaisamy, M.
    Murali, K. R.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 503 (01) : 170 - 176
  • [7] Effects of annealing conditions on optical and electrical characteristics of titanium dioxide films deposited by electron beam evaporation
    Mikhelashvili, V
    Eisenstein, G
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (06) : 3256 - 3269
  • [8] Hardness of electron beam deposited titanium carbide films on titanium substrate
    Ferro, D
    Scandurra, R
    Latini, A
    Rau, JV
    Barinov, SM
    JOURNAL OF MATERIALS SCIENCE, 2004, 39 (01) : 329 - 330
  • [9] Hardness of electron beam deposited titanium carbide films on titanium substrate
    D. Ferro
    R. Scandurra
    A. Latini
    J. V. Rau
    S. M. Barinov
    Journal of Materials Science, 2004, 39 : 329 - 330
  • [10] Characterization of ternary MgxZn1-xO thin films deposited by electron beam evaporation
    Ashraf, M.
    Akhtar, S. M. J.
    Qayyum, A.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2012, 15 (03) : 251 - 257