Anisotropic wet etching for micro-fabrication

被引：0

作者：

Nagoya University, Froh, Chikusa, Nagoya, Aichi 464-8603, Japan ^{[1
]}

机构：

[1] Nagoya University, Froh, Chikusa, Nagoya

来源：

IEEJ Trans. Sens. Micromach. | 2008年 / 9卷 / 341-346期

关键词：

Advanced wet etching process; Anisotropic etching; Etch-pit; Micro-pyramid;

D O I：

10.1541/ieejsmas.128.341

中图分类号：

学科分类号：

摘要：

Anisotropic wet etching process is now widely used in MEMS fabrication. The etching characteristics, mechanism of etch-pit formations on both of {100} and {111} Si surfaces, and micro pyramid formation on the etched {100} surface is described in this review paper. Advanced processes for fabricating complicated 3-D structures by wet etching are also explained. © 2008 The Institute of Electrical Engineers of Japan.

引用

页码：341 / 346

页数：5

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