Study of chucking force distribution according to substrate pattern and deformation characteristics of electrostatic chuck for deposition

被引:0
|
作者
Kim, Seong Bin [1 ]
Kim, Ju Hye [1 ]
Min, Dong Kyun [2 ]
机构
[1] Korea Univ Technol & Educ, Dept Mechatron Engn, Cheonan 31253, South Korea
[2] Korea Univ Technol & Educ, Sch Mechatron Engn, Cheonan 31253, South Korea
关键词
Electrostatic chuck; Electroadhesion; Electrode pattern; Chucking force; Finite element analysis; Maxwell stress tensor; Air gap;
D O I
10.1016/j.elstat.2024.104008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An electrostatic chuck is a device used for the force between charges applied between two parallel plates to attract and secure substrates, such as wafers or OLED panels. Unlike mechanical adhesion methods, which rely on physical fixation, this method uses electrostatic forces for adhesion, making it crucial to verify the chucking force. As the size of the substrate increased, deformation due to gravity or the chucking force also increased, and the chucking force decreased sharply as the distance between the chuck and the substrate increased. This distance between the chuck and the substrate is represented by an Air Gap. With the trend of displays shifting from small to large OLEDs, the consideration of substrate deformation has become necessary. In this study, to verify substrate deformation through various patterns, a simplified 2D model using Maxwell, an electromagnetic field analysis program, and Mechanical, a static structural analysis program, both by Ansys, was utilized to observe changes in adhesive force. Additionally, 3D modeling was applied to verify the adhesive force and deformation according to the voltage and size of various patterns.
引用
收藏
页数:8
相关论文
共 50 条
  • [1] CHUCKING FORCE DISTRIBUTION OF COLLET CHUCK HOLDERS FOR MACHINING CENTERS
    TSUTSUMI, M
    JOURNAL OF MECHANICAL WORKING TECHNOLOGY, 1989, 20 : 491 - 501
  • [2] STUDY ON THE CHUCKING FORCE OF AN ELECTRO-MAGNETIC CHUCK
    SAITO, Y
    NISHIWAKI, N
    OOTANI, T
    OKIMOTO, K
    BULLETIN OF THE JSME-JAPAN SOCIETY OF MECHANICAL ENGINEERS, 1985, 28 (237): : 515 - 522
  • [3] STUDY ON THE CHUCKING FORCE OF AN ELECTRO-MAGNETIC CHUCK.
    Tokyo Inst of Technology, Dep of, Mechanical Engineering, Tokyo, Jpn, Tokyo Inst of Technology, Dep of Mechanical Engineering, Tokyo, Jpn
    Bulletin of the JSME, 1985, 28 (237): : 515 - 522
  • [4] Doping Effect on Characteristics of Al2O3 Ceramics for Glass Substrate Electrostatic Chucking
    Kang, D. H.
    Kim, Y. H.
    Ahn, H. K.
    Hwang, J. H.
    ADVANCED MATERIAL ENGINEERING (AME 2015), 2016, : 59 - 64
  • [5] Experimental Study on Tailings Deposition Distribution Pattern and Sedimentation Characteristics
    Tian, Sen
    Zhao, Ying
    Gong, Yuanheng
    Wang, Guangjin
    ACS OMEGA, 2024, 9 (17): : 19428 - 19439
  • [6] Electrode Shape Optimization of Electrostatic Chuck for Uniform Force Distribution using Continuum Sensitivity Analysis
    Park, Jong Oh
    Choi, Chan Young
    Lee, Jun Seong
    Hong, Seung Geon
    Park, Il Han
    2019 22ND INTERNATIONAL CONFERENCE ON ELECTRICAL MACHINES AND SYSTEMS (ICEMS 2019), 2019, : 3305 - 3309
  • [7] Study of a clamping process with no deformation for a thin substrate using a freezing pin chuck system
    Yoshitomi, Kenichiro
    Une, Atsunobu
    Tada, Kazuki
    PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2020, 64 : 45 - 52
  • [8] Monitoring of the fatigue of d16aN, alloy according to the characteristics of deformation surface pattern
    Ignatovich, S. R.
    Yutskevich, S. S.
    MATERIALS SCIENCE, 2012, 47 (05) : 636 - 643
  • [9] Monitoring of the fatigue of d16aт alloy according to the characteristics of deformation surface pattern
    S. R. Ignatovich
    S. S. Yutskevich
    Materials Science, 2012, 47 : 636 - 643
  • [10] Study of a dust deposition mechanism dominated by electrostatic force on a solar photovoltaic module
    Liu, Xueqing
    Yue, Song
    Li, Jianlan
    Lu, Luyi
    SCIENCE OF THE TOTAL ENVIRONMENT, 2021, 754