Pad surface treatment to control performance of chemical mechanical planarization

被引：0

作者：

Park, Jaehong ^{[1
,2
]}

Juno, Haedo ^{[1
]}

Yoshida, Koichi ^{[2
]}

Kinoshita, Masaharu ^{[2
]}

机构：

[1] Department of Precision Mechanical Engineering, Pusan National University, Changjeon-dong, Kumjung-gu, Pusan 609-735, Korea, Republic of

[2] Nitta-Haas Inc., Kannabidai, Kyotanahe, Kyoto 610-0333, Japan

来源：

Japanese Journal of Applied Physics | 2008年 / 47卷 / 2 PART 1期

关键词：

High frequency components - Low-frequency components - Mechanical surface treatment - Mechanical treatments - Polishing pads - Profile - Removal rate - Uniformity;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1028 / 1033