Fabrication and ultraviolet photoemission characteristics of novel Au photocathodes

被引：4

作者：

Wang, Yuying ^{[1
,2
]}

Gao, Yang ^{[1
]}

Wang, Xuemin ^{[1
]}

Cao, Zhurong ^{[1
]}

Yi, Zao ^{[1
,2
]}

Xu, Xibin ^{[1
,2
]}

Yi, Yougen ^{[2
]}

Wu, Weidong ^{[1
]}

机构：

[1] Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, CAEP, Mianyang 621900

[2] College of Physical Science and Technology, Central South University

来源：

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2013年 / 25卷 / 10期

关键词：

Au nano-films; Photocathode; Surface potential; Surface structure; UV photoemission characteristics;

D O I：

10.3788/HPLPB20132510.2627

中图分类号：

学科分类号：

摘要：

The DC magnetron sputtering was explored to fabricate Au thin films with thicknesses of 5, 10, 15, 20 nm on the silica substrates. These films were annealed in high purity nitrogen ambient at 800°C and Au particles of different diameters were obtained on the silica substrates. The novel Au photocathodes were prepared by depositing a layer of 50 nm Au film on the silica substrates with Au particles. SEM showed that Au photocathodes with particles ranging from 300-800 nm were obtained. The photoemission characteristics of Au photocathodes under ultraviolet light between 190-360 nm were obtained, which indicated that the novel Au photocathodes with nano-particles emitted 10 times more photoelectrons than the plane Au photocathodes. This result is explained by semi-classical three-step model of photoemission.

引用

页码：2627 / 2630

页数：3

共 12 条

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