Comparative analysis of thermally evaporated nanoscale CdS thin film's structural, morphological, optical and nanomechanical properties

CdS nanoscale thin films were deposited on glass substrates at 1, 5 and 10 & Aring;/s deposition rates by thermal evaporation process. The structural, morphological, compositional, optical and nanomechanical properties of CdS thin films were analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), energy dispersive x-ray (EDX), UV-vis spectrophotometer and nanoindentation. XRD diffractogram indicate that the deposited CdS thin films have hexagonal structure with preferred orientation towards (002) plane and nearly stoichiometric composition. Various crystal structure parameters like lattice constant, crystallite size, defect density, dislocation density, lattice strain, number of crystallite per unit surface, stacking fault were determined. From XRD results, the calculated crystal structure parameters such as the crystallite size, microstrain and defect density were in the range of 20.4-14.7 nm, 7.74-10.62 and 2.3-4.52 x 1011 lines/cm2, at 1, 5and 10 & Aring;/s deposition rates, respectively .The AFM images indicated that the film's rms surface roughnesses were 2.73 nm, 2.94 nm and 3.18 nm at 1, 5and 10 & Aring;/s, respectively. The SEM images indicated that the films were uniform, continuous and defect free. The EDX examination revealed that at 1 & Aring;/s deposition rate the film was nearly stoichiometic. The optical band gaps were determined to be in the range of 2.37-2.43 eV. Nanoindentation tests evaluated the hardness, Young's modulus, creep behavior and strain rate of CdS films. Hardness evaluated to be 0.14-1.48 GPa, 0.15-2.46 GPa, and 0.21-2.55 GPa at 1,5 and 10 & Aring;/s deposition rate, respectively for 20-50 mu N load. The Young's modulus decreases 1-5 & Aring;/s deposition rate and becomes almost constant 5-10 & Aring;/s deposition rate at 70 mu N load. The characterization of CdS thin film recommend it as a favorable window layer in applications like photovoltaic, optoelectronic, thermoelectric and solar cells.