Effect of inert gas on radicals during diamond film being deposited by HFCVD

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作者：
Province Key Laboratory of Plasma Chemistry and Advanced Materials, School of Materials Science and Technology, Wuhan Institute of Technology, Wuhan, China [1 ]
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来源：
Qiangjiguang Yu Lizishu | / 12卷
关键词：
Feed gas - Gas volume fraction - Hot-filament chemical vapor deposition - Intensity ratio - Optical emission spectroscopies (OES) - Situ measures - Spectrum intensity;
D O I：
10.11884/HPLPB201527.122005
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